Epitaxial YIG films can be used for example for electronically tunable delay lines and phase shifters, which require film thicknesses in the micrometer range. Further fields of application could be integrated non-reciprocal components such as magneto-optical isolators and circulators as well as Bragg cell modulators for integrated optics. At present, internationally efforts are being made to develop these isolator films as a promising base material for spin wave devices (YIG magnonics) with micro- and nanostructures (nano-magnonics) in information processing and to link them with electronic and spin electronic elements via suitable interfaces.

The miniaturization of these components requires film thicknesses in the sub-micrometer range. Epitaxial films are fabricated by liquid phase epitaxy technique (LPE) from high temperature solutions and single crystals by single crystal growth techniques. The LPE growth technology enables to fabricate epitaxial yttrium iron garnet films in the micrometer as well as in the sub-micrometer range and to develop customized functional layers by suitable substitution.

LPE technology compared to other deposition processes

• Realization of film thicknesses between 100 nm and 20 µm while maintaining high structural perfection over the entire layer thickness
• Formation of extremely smooth surfaces possible